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KV-300 Film Thickness System

* Compact footprint with high reliability R - theta stage * Generate thickness contour map in less than one minute * Internal reference - calibration standard to maintain accuracy * Produces no stray white light * Optical design eliminates need for focusing * Simple maintenance: semiannual lamp change done in minutes Configurations: * Different thickness ranges * Monochrome camera system * Vacuum chuck * Manual positioning (KV-300m)

KF-10 Film Thickness System
* Compact footprint with high reliability R - theta stage * Generate thickness contour map in less than one minute * Internal reference - calibration standard to maintain accuracy * Produces no stray white light * Optical design eliminates need for focusing * Simple maintenance: semiannual lamp change done in minutes with no tools * 3" to 200 mm stage

	L-2 Film Thickness System
* Low cost film thickness metrology system * Manual wafer positioning * Optional Windows PC * Produces no stray white light * Optical design eliminates need for focusing * Simple maintenance: semiannual lamp change done in minutes with no tools

Si-71 Wafer Thickness System

Introducing patented, breakthrough technology! This product optically measures the thickness of silicon or other materials using infrared light. This tool can help solve your backthinned wafer yield problems or enable reduced thicknesses. * Materials: Si, GaAs, InP, quartz, resist, ... * Measure bumped wafers * Measure through tape on top or bottom * Allows conductive substrates * 300 mm vacuum chuck * Also available as manual positioning or as an integrated metrology tool

Foothill Instruments Metrology Application, Main Screen

Production mode * Automatically measure multiple sites on wafer * One button RUN generates thickness results with statistics * Alerts may be defined for thickness and fit out of range condition * Advanced Wafermap® software for mapping and statistical process control (SPC) production screen capture Semi-auto mode * Allow mapping with manual positioning Engineer mode * Manual site measurement * Pattern and film editors for production program definition * Sophisticated editor generates grid, ring, line, or custom patterns * Absolute reflectivity measurements * Export reflectivity and model data to text files * Maintenance functions

Foothill Instruments Metrology Application, Mapping Screen

*Configurable 1D- (line scan), 2D- (contour or colored), and value plots *Configurable 3D- (solid or wire frame), 3D bar chart, and sigma range plots *Statistical analysis (histogram, calculation of mean, standard deviation, max, min, etc.) *Global operations (add, subtract, divide, square, square root, etc.) *1st and 2nd derivative of a map *File compare operations (add, multiply, ratio, average etc.) *File operations are applicable to files with different site distributions