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Approximately two years ago, we purchased a thin-films measurement system manufactured by Foothill Instruments for the purpose
of measuring photoresist, oxides, and other thin films. The tool has proven to be a very vital, reliable, and accurate resource
in our fabrication process. The service/technical support is excellent, and I would recommend the system to anyone needing
such a tool.
Scott McCoy, MEMS Optical, Huntsville, AL.
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We are using our KT-22 since more than 3 years for the manufacturing of high-quality micro-optics (microlens arrays) in
our 200mm-wafer-size fab - we are still very satisfied with the instrument itself and the rapid and competent support from
Foothill Instruments.
We use the KT-22 for full wafer inspection of thin and thick photoresist layers (from 100nm up to 80 microns thickness)
on both, fused silica and silicon wafers.
The KT-22 was the important key instrument for optimizing our SUSS MicroTec RC8-THP and ACS200 fully automated spin-coaters
to the limits. The rapid, non-destructive full wafer mapping of the KT-22 enabled us to achieve resist uniformities <1%
for 200mm wafers and thick photoresist.
As the uniformity of the resist layer is a very critical manufacturing issue we inspect today every coated wafer before
it is passed to the exposure step. This enabled us to save manufacturing costs by detecting coating errors before the wafer
further processed.
We can highly recommend the Foothill Instrument KT-22 for any process development and production steps where a precise
control of resist thickness and uniformity is necessary.
Please feel free to contact me for further details or comments!
Reinhard Völkel, SUSS MicroOptics SA
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